The 193nm Glan laser prism uses EUV Crystal with high optical uniformity, featuring excellent polarization stability in narrow bandwidth. Precision packaging reduces optical path deviation, suitable for high-precision deep-UV laser detection.
Features: Air-Spaced Close to Brewster's Angle Cutting High Polarization Purity Mounted with escape window Suitable for High Power Application |
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Prekės Nr. :
GLP-193Produkto kilmė :
FuZhouSpecifications:
Material: | EUV Crystal |
Wavelength Range: | 193.368nm |
Extinction Ratio: | <1x10-4 |
Parallelism: | <1 arc Min |
Surface Quality: | 20/10 |
Beam Deviation: | < 3 arc minutes |
Wavefornt Distortion: | λ/4@632.8nm |
Damage Threshold: | >500 MW/cm2 |
193nm Glan Laser Polarizers
Part No. | Wavelength Rang(nm) | Extinction Ratio | Angular Field(°) | C.A. fa(mm) | O.D. fd(mm) | L ±0.1(mm) |
GLP4006 | 193.368 | <5x10-6 | >6.0 | 6.0 | 15.0 | 29.0 |
GLP4008 | 8.0 | 25.4 | 31.0 | |||
GLP4010 | 10.0 | 25.4 | 31.0 | |||
GLP4015 | 15.0 | 30.0 | 38.6 | |||
GLP4020 | 20.0 | 38.0 | 48.9 |
The technical advantages of 193nm Glan Laser Polarizers:
The technical advantages of 193nm Glan Laser Polarizers include high polarization purity, maintaining stable performance even under wide-angle incidence. They have excellent thermal stability with minimal optical fluctuation over a broad temperature range. With strong laser damage resistance, they suit high-power deep-UV scenarios. Compatible with deep-UV optical systems and easy to install, they precisely meet high-precision needs like lithography and laser detection.